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The Hall resistance R H vs. perpendicular field H p at different Co thickness of 0.159 nm, 0.209 nm, 0.260 nm, 0.294 nm, 0.344 nm, and 0.395 nm in Co-wedged Si/SiO 2 /[Pt(1)/Co( t Co )] 5 /Mg(2) film stacks.
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