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Schematic illustration of the 3D nanofabrication based on TPL. The photoresist contains an elastomer (urethane acrylate oligomer, UAO), a hydrogel (poly(ethylene glycol) diacrylate, PEGDA) and embedded MNPs. MNPs comprise only 3% of the photoresist to avoid the laser scattering during lithography. The local elasticity is dependent on the spatially programmed fabrication laser power. The picosprings are responsive to piconewton-scale forces, such as those arising from microswimmers or from driving magnetic fields. Picosprings perform specific functions in customized soft micromachines with different configurations.

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